Laboratory Equipment & Services Information System by Centralized Laboratory Management Office (CeLMO)

The POLOS SPIN150i spin coater is a versatile and high-quality substrate spin coater, made out of PTFE or NPP. It is specifically designed for R&D and low volume production. Users may program the spin coater with custom programs of the system for the deposition of uniform thin layer especially for photoresist process. SYSTEM FEATURES • Substrates size: up to 6” wafer or up to 4" x 4" • Maximum speed: 1000 rpm. • Central dispensing syringe holder consists of a maximum of 3 syringe holder. • Vacuum chuck adapter for small substrate for various dimension from 0.5 inch (1 cm) up to 6 inch (15 cm) diameter sample size. • USB Port. • Weight: 14 kg.